@article {46,
	title = {Characterization of urea derived polymeric carbon nitride and resultant thermally vacuum deposited amorphous thin films: Structural, chemical and photophysical properties.},
	journal = {Carbon},
	volume = {107},
	year = {2016},
	note = {CAPLUS AN 2016:1055602(Journal; Online Computer File)},
	month = {2016},
	pages = {415 - 425},
	publisher = {Elsevier Ltd.},
	abstract = {Polymeric carbon nitride (p-CN) was produced using a two-step thermal treatment process of urea without tailoring the reaction pressure and atm.  A systematic anal. employing XPS, Fourier transform IR spectroscopy, Raman scattering and x-ray diffraction (x-ray diffraction) was performed for structural and chem. characterization of p-CN.  Thermal vacuum deposition of thin films (C3N) from p-CN powder was performed, followed by characterization of corresponding structural, chem. and photophys. properties.  The at. force microscopy anal. of these films revealed sheet-like structural fragments distributed along the surface.  The C3N thin films were amorphous as detd. from x-ray diffraction.  C3N can be used as a functional layer for optoelectronic devices. [on SciFinder(R)]},
	keywords = {urea polymeric carbon nitride amorphous film photocatalyst optoelectronic device},
	isbn = {0008-6223},
	author = {Lazauskas, A. and Baltrusaitis, J. and Puodziukynas, L. and Andrulevicius, M. and Bagdziunas, G. and Volyniuk, D. and Meskinis, S. and Niaura, G. and Tamulevicius, T. and Jankauskaite, V.}
}
