@article {78,
	title = {Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge.},
	journal = {Plasma Chemistry and Plasma Processing},
	volume = {34},
	year = {2014},
	note = {CAPLUS AN 2013:2010942(Journal; Online Computer File)},
	pages = {271 - 285},
	publisher = {Springer},
	abstract = {Herein, we present a simple method for fabricating plasma polymd. hexamethyldisiloxane films (pp-HMDSO) possessing superhydrophobic characteristics via arc discharge.  The pp-HMDSO films were deposited on a soda-lime-silica float glass using HMDSO monomer vapor as a precursor.  A detailed surface characterization was performed using SEM and at. force microscopy.  The growth process of the pp-HMDSO films was investigated as a function of deposition time from 30 to 300 s.  The non-wetting characteristics of the pp-HMDSO films were evaluated by means of contact angle (CA) measurements and correlated with the morphol. characteristics, as obtained from microscopy measurements.  The deposited films were found to be nano-structured and exhibited dual-scale roughness with the static CA values close to 170{\textdegree}.  Fourier transform IR spectroscopy anal. was carried out to investigate chem. and functional properties of these films.  Me groups were identified spectroscopically to be present within the pp-HMDSO films and were proposed to result in the low surface energy of material.  The synergy between the dual-scale roughness and low surface energy resulted in the superhydrophobic characteristics of the pp-HMDSO films.  A possible mechanism for the pp-HMDSO film formation is proposed. [on SciFinder(R)]},
	keywords = {plasma polymd hexamethyldisiloxane film arc discharge},
	isbn = {0272-4324},
	author = {Lazauskas, Algirdas and Baltrusaitis, Jonas and Grigaliunas, Viktoras and Jucius, Dalius and Guobiene, Asta and Prosycevas, Igoris and Narmontas, Pranas.}
}
