@article {78,
	title = {Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge.},
	journal = {Plasma Chemistry and Plasma Processing},
	volume = {34},
	year = {2014},
	note = {CAPLUS AN 2013:2010942(Journal; Online Computer File)},
	pages = {271 - 285},
	publisher = {Springer},
	abstract = {Herein, we present a simple method for fabricating plasma polymd. hexamethyldisiloxane films (pp-HMDSO) possessing superhydrophobic characteristics via arc discharge.  The pp-HMDSO films were deposited on a soda-lime-silica float glass using HMDSO monomer vapor as a precursor.  A detailed surface characterization was performed using SEM and at. force microscopy.  The growth process of the pp-HMDSO films was investigated as a function of deposition time from 30 to 300 s.  The non-wetting characteristics of the pp-HMDSO films were evaluated by means of contact angle (CA) measurements and correlated with the morphol. characteristics, as obtained from microscopy measurements.  The deposited films were found to be nano-structured and exhibited dual-scale roughness with the static CA values close to 170{\textdegree}.  Fourier transform IR spectroscopy anal. was carried out to investigate chem. and functional properties of these films.  Me groups were identified spectroscopically to be present within the pp-HMDSO films and were proposed to result in the low surface energy of material.  The synergy between the dual-scale roughness and low surface energy resulted in the superhydrophobic characteristics of the pp-HMDSO films.  A possible mechanism for the pp-HMDSO film formation is proposed. [on SciFinder(R)]},
	keywords = {plasma polymd hexamethyldisiloxane film arc discharge},
	isbn = {0272-4324},
	author = {Lazauskas, Algirdas and Baltrusaitis, Jonas and Grigaliunas, Viktoras and Jucius, Dalius and Guobiene, Asta and Prosycevas, Igoris and Narmontas, Pranas.}
}
@article {166,
	title = {E-beam lithography of computer generated holograms using fully vectorial 3D beam propagation method.},
	journal = {Microelectronic Engineering},
	volume = {87},
	year = {2010},
	note = {CAPLUS AN 2010:985606(Journal)},
	month = {2010///},
	pages = {2332 - 2337},
	publisher = {Elsevier B.V.},
	abstract = {A fully vectorial 3D beam propagation method (BPM) has been applied to obtain a required pattern of computer generated hologram (CGH) with a variable profile of four phase levels.  The computer reconstruction of the CGH image having one and two focal spots was performed by application of the fully vectorial 3D BPM method.  After transferring the CGH by EBL technique an adequate phase profile was obtained.  Inter-level parameter method was developed to obtain the estd. an electron beam dose required for the even topog. patterning.  Using this method, an EBL exposure dose detd. to achieve the required relief amplitude of 1.29 μm was 43 μC/cm2.  The manufd. holograms showed that the overall proposed prodn. process, from the 3D BPM computer simulation to e-beam lithog., can be used to obtain good quality product with reasonable time and computational resources. [on SciFinder(R)]},
	keywords = {electron beam lithog computer generated holograms fully vectorial 3D},
	isbn = {0167-9317},
	author = {Petruskevicius, Raimondas and Baltrusaitis, Jonas and Kezys, Darius and Mikolajunas, Marius and Grigaliunas, Viktoras and Virzonis, Darius.}
}
