@article {112,
	title = {Polyvinylpyrrolidone surface modification with SiOx containing amorphous hydrogenated carbon (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx films using Hall-type closed drift ion beam source.},
	journal = {Thin Solid Films},
	volume = {538},
	year = {2013},
	note = {CAPLUS AN 2012:1904654(Journal; Online Computer File)},
	pages = {25 - 31},
	publisher = {Elsevier B.V.},
	abstract = {In this study SiOx contg. amorphous hydrogenated C (a-C:H/SiOx) and N-doped a-C:H/SiOx (a-C:H:N/SiOx) films were deposited on polyvinylpyrrolidone (PVP) templates of variable thickness using a Hall-type closed drift ion beam source with const. irradn. parameters.  A detailed surface characterization was followed using at. force microscopy (AFM) topog. images, surface morphol. parameters, height distribution histograms and bearing ratio curves with hybrid parameters.  The AFM anal. directly showed that the a-C:H/SiOx/PVP and a-C:H:N/SiOx/PVP composite films represent different morphologies with characteristic surface textures.  Surface adhesive properties were evaluated by measuring the force required to sep. the AFM tip from the surface by AFM force-distance curves.  The variance in adhesion force detected was lower for a-C:H/SiOx/PVP composite films due to lower structural homogeneity of the surfaces.  FTIR spectroscopy anal. was performed to study the blend behavior of PVP upon a-C:H/SiOx and a-C:H:N/SiOx direct ion beam deposition.  Interfacial interactions of PVP with the direct ion beam induced changes in the carbonyl group of the PVP and are dependent on the carrier gas used for the synthesis of the amorphous hydrogenated C films. [on SciFinder(R)]},
	keywords = {ion beam, polyvinylpyrrolidone PVP surface modification amorphous carbon silicon oxide},
	isbn = {0040-6090},
	author = {Lazauskas, A. and Grigaliunas, V. and Guobiene, A. and Puiso, J. and Prosycevas, I. and Baltrusaitis, J.}
}
@article {169,
	title = {Principles of electrochemical reduction of Na2MoO4 on a Se/SnO2/glass surface.},
	journal = {Chemine Technologija (Kaunas, Lithuania)},
	year = {2010},
	note = {CAPLUS AN 2010:548442(Journal)},
	month = {2010///},
	pages = {28 - 35},
	publisher = {Technologija},
	abstract = {Na2MoO4 electrochem. redn. from 0.22 mol/dm3 sodium citrate supporting soln. was investigated by the cyclic voltammetry, XPS and lateral force microscopy techniques.  Exptl. results have indicated that molybdenum oxide is initially deposited on the Se/SnO2/glass surface in a potential range from -0.20 V to -0.80 V.  XPS anal. exhibited the molybdenum oxide stoichiometry of 2.9.  The nucleation mechanism of MoOx onto Se/SnO2/glass surface was investigated by the current transient technique.  The deposition transients analyzed in the non-dimensional plots I2/I2m = f(t/tm) and I2/I2m = f(t/tm)2 have shown that MoOx nucleates according to a progressive mechanism.  The nucleation rate depends on Na2MoO4 concn. in the supporting electrolyte and on the deposition potential. [on SciFinder(R)]},
	keywords = {sodium molybdate electrochem redn tin dioxide selenium glass surface},
	isbn = {1392-1231},
	author = {Sinkeviciute, D. and Dukstiene, N. and Baltrusaitis, J. and Guobiene, A.}
}
