@article {46,
	title = {Characterization of urea derived polymeric carbon nitride and resultant thermally vacuum deposited amorphous thin films: Structural, chemical and photophysical properties.},
	journal = {Carbon},
	volume = {107},
	year = {2016},
	note = {CAPLUS AN 2016:1055602(Journal; Online Computer File)},
	month = {2016},
	pages = {415 - 425},
	publisher = {Elsevier Ltd.},
	abstract = {Polymeric carbon nitride (p-CN) was produced using a two-step thermal treatment process of urea without tailoring the reaction pressure and atm.  A systematic anal. employing XPS, Fourier transform IR spectroscopy, Raman scattering and x-ray diffraction (x-ray diffraction) was performed for structural and chem. characterization of p-CN.  Thermal vacuum deposition of thin films (C3N) from p-CN powder was performed, followed by characterization of corresponding structural, chem. and photophys. properties.  The at. force microscopy anal. of these films revealed sheet-like structural fragments distributed along the surface.  The C3N thin films were amorphous as detd. from x-ray diffraction.  C3N can be used as a functional layer for optoelectronic devices. [on SciFinder(R)]},
	keywords = {urea polymeric carbon nitride amorphous film photocatalyst optoelectronic device},
	isbn = {0008-6223},
	author = {Lazauskas, A. and Baltrusaitis, J. and Puodziukynas, L. and Andrulevicius, M. and Bagdziunas, G. and Volyniuk, D. and Meskinis, S. and Niaura, G. and Tamulevicius, T. and Jankauskaite, V.}
}
@article {117,
	title = {Surface morphology, cohesive and adhesive properties of amorphous hydrogenated carbon nanocomposite films.},
	journal = {Applied Surface Science},
	volume = {276},
	year = {2013},
	note = {CAPLUS AN 2013:610809(Journal; Online Computer File)},
	pages = {543 - 549},
	publisher = {Elsevier B.V.},
	abstract = {In this work, amorphous hydrogenated carbon (a-C:H), SiOx-contg. a-C:H (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx (a-C:H:N/SiOx) thin films were deposited on chromium thin film-coated glass using a closed drift ion beam source.  Acetylene gas, hexamethyldisiloxane and hydrogen or 20\% nitrogen/hydrogen mixt. were used as precursors.  Resulting hydrogenated carbon thin film surface morphol. as well as their cohesive and adhesive properties were studied using progressive loading scratch tests followed by optical microscopy anal.  Surface anal. was also performed using at. force microscopy via topog., surface morphol. parameter, height distribution histogram and bearing ratio curve based hybrid parameter measurements.  The a-C:H/SiOx and a-C:H:N/SiOx thin films showed better mech. strength as compared to the conventional a-C:H films.  XPS was used to det. the chem. compn. of these films.  It showed increased amts. of silicon and absence of terminal oxygenated carbon bonds in a-C:H:N/SiOx thin film which was attributed to its improved mech. properties. [on SciFinder(R)]},
	keywords = {amorphous hydrogenated carbon film morphol property nitrogen silicon doping},
	isbn = {0169-4332},
	author = {Lazauskas, A. and Grigaliunas, V. and Meskinis, S. and Ecarla, F. and Baltrusaitis, J.}
}
