@article {166,
	title = {E-beam lithography of computer generated holograms using fully vectorial 3D beam propagation method.},
	journal = {Microelectronic Engineering},
	volume = {87},
	year = {2010},
	note = {CAPLUS AN 2010:985606(Journal)},
	month = {2010///},
	pages = {2332 - 2337},
	publisher = {Elsevier B.V.},
	abstract = {A fully vectorial 3D beam propagation method (BPM) has been applied to obtain a required pattern of computer generated hologram (CGH) with a variable profile of four phase levels.  The computer reconstruction of the CGH image having one and two focal spots was performed by application of the fully vectorial 3D BPM method.  After transferring the CGH by EBL technique an adequate phase profile was obtained.  Inter-level parameter method was developed to obtain the estd. an electron beam dose required for the even topog. patterning.  Using this method, an EBL exposure dose detd. to achieve the required relief amplitude of 1.29 μm was 43 μC/cm2.  The manufd. holograms showed that the overall proposed prodn. process, from the 3D BPM computer simulation to e-beam lithog., can be used to obtain good quality product with reasonable time and computational resources. [on SciFinder(R)]},
	keywords = {electron beam lithog computer generated holograms fully vectorial 3D},
	isbn = {0167-9317},
	author = {Petruskevicius, Raimondas and Baltrusaitis, Jonas and Kezys, Darius and Mikolajunas, Marius and Grigaliunas, Viktoras and Virzonis, Darius.}
}
