@article {117,
	title = {Surface morphology, cohesive and adhesive properties of amorphous hydrogenated carbon nanocomposite films.},
	journal = {Applied Surface Science},
	volume = {276},
	year = {2013},
	note = {CAPLUS AN 2013:610809(Journal; Online Computer File)},
	pages = {543 - 549},
	publisher = {Elsevier B.V.},
	abstract = {In this work, amorphous hydrogenated carbon (a-C:H), SiOx-contg. a-C:H (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx (a-C:H:N/SiOx) thin films were deposited on chromium thin film-coated glass using a closed drift ion beam source.  Acetylene gas, hexamethyldisiloxane and hydrogen or 20\% nitrogen/hydrogen mixt. were used as precursors.  Resulting hydrogenated carbon thin film surface morphol. as well as their cohesive and adhesive properties were studied using progressive loading scratch tests followed by optical microscopy anal.  Surface anal. was also performed using at. force microscopy via topog., surface morphol. parameter, height distribution histogram and bearing ratio curve based hybrid parameter measurements.  The a-C:H/SiOx and a-C:H:N/SiOx thin films showed better mech. strength as compared to the conventional a-C:H films.  XPS was used to det. the chem. compn. of these films.  It showed increased amts. of silicon and absence of terminal oxygenated carbon bonds in a-C:H:N/SiOx thin film which was attributed to its improved mech. properties. [on SciFinder(R)]},
	keywords = {amorphous hydrogenated carbon film morphol property nitrogen silicon doping},
	isbn = {0169-4332},
	author = {Lazauskas, A. and Grigaliunas, V. and Meskinis, S. and Ecarla, F. and Baltrusaitis, J.}
}
@article {142,
	title = {Scaling down lateral dimensions of silicon nanopillars fabricated by reactive ion etching with Au/Cr self-assembled clusters as an etch mask.},
	journal = {Thin Solid Films},
	volume = {520},
	year = {2012},
	note = {CAPLUS AN 2012:110019(Journal; Online Computer File)},
	month = {2012///},
	pages = {2041 - 2045},
	publisher = {Elsevier B.V.},
	abstract = {Nanodot and nanopillar structures and precisely controlled reproducible fabrication thereof are of great interest in common nanoelectronic devices, including photonic crystals and surface plasmon resonance instruments.  In this work, fabrication process of the silicon nanopillar structures is described.  It includes self-organization of gold and chromium clusters at thickness close to that of one at. diam. to serve as etching masks followed by the reactive ion etching to form silicon nanopillars.  SEM and XPS were used to characterize self-organized gold and chromium clusters as well as the final silicon nanopillars.  This method was found to produce silicon nanopillars of sub-10 nm lateral dimensions and the diam.-to-height aspect ratio of up to 1:14. [on SciFinder(R)]},
	keywords = {silicon nanopillar reactive ion etching gold chromium cluster},
	isbn = {0040-6090},
	author = {Kaliasas, R. and Baltrusaitis, J. and Mikolajunas, M. and Jakucionis, L. and Virzonis, D.}
}
@article {178,
	title = {A study of stacked PECVD silicon nitride films used for surface micromachined membranes.},
	journal = {Thin Solid Films},
	volume = {516},
	year = {2008},
	note = {CAPLUS AN 2008:1086703(Journal)},
	month = {2008///},
	pages = {8788 - 8792},
	publisher = {Elsevier B.V.},
	abstract = {Silicon nitride stacked films contg. three layers differing in mech.-chem. properties are synthesized using plasma-enhanced chem. vapor deposition method from monosilane (SiH4) and ammonia (NH3) mixt.  The compn. is analyzed using XPS and stress is measured using a substrate bending method.  The ability to obtain stacked films with the custom tensile stress in the overall structure was demonstrated by the series of expts.  The tensile stress in the top and bottom films was obtained between 200 and 300 MPa whereas the stress in the middle film could be adjusted from compressive 60 MPa to tensile 300 MPa.  Since the appropriate stress value is important in achieving required mech. properties of the membranes, the results obtained are discussed in the context of surface micromachined membrane structures. [on SciFinder(R)]},
	keywords = {plasma CVD stacked silicon nitride film surface micromachined membrane},
	isbn = {0040-6090},
	author = {Mikolajunas, M. and Kaliasas, R. and Andrulevicius, M. and Grigaliunas, V. and Baltrusaitis, J. and Virzonis, D.}
}
