@article {96,
	title = {Thermally-driven structural changes of graphene oxide multilayer films deposited on glass substrate.},
	journal = {Superlattices and Microstructures},
	volume = {75},
	year = {2014},
	note = {CAPLUS AN 2014:1440905(Journal; Online Computer File)},
	pages = {461 - 467},
	publisher = {Elsevier Ltd.},
	abstract = {Graphene oxide (GO) has been recognized as an important intermediate compd. for a potential low-cost large-scale graphene-like film fabrication.  In this work, graphene oxide multilayer films deposited on glass substrate were reduced using different thermal redn. methods, including low-temp. annealing, flame-induced and laser redn., and the corresponding surface morphol. and structural properties were investigated.  These graphene oxide thermal redn. methods strongly affected surface morphol. and differently facilitated structural and chem. transformations of graphene oxide.  As evidenced by Raman measurements, thermal annealing and laser redn. of graphene oxide produced more ordered graphene-like structure multilayer films.  However, surface morphol. differences were obsd. and attributed to the different de-oxidn. mechanisms of GO.  This Letter provides an important systematic comparison between the GO redn. methods and thermally-driven structural changes they provide to the reduced GO multilayer films obtained. [on SciFinder(R)]},
	keywords = {glass substrate graphene oxide multilayer film deposition structural change},
	isbn = {0749-6036},
	author = {Lazauskas, A. and Baltrusaitis, J. and Grigaliunas, V. and Guobiene, A. and Prosycevas, I. and Narmontas, P. and Abakeviciene, B. and Tamulevicius, S.}
}
@article {123,
	title = {Tribological properties of the two-step thermally deposited chromium films.},
	journal = {Applied Surface Science},
	volume = {283},
	year = {2013},
	note = {CAPLUS AN 2013:1219922(Journal; Online Computer File)},
	pages = {1089 - 1095},
	publisher = {Elsevier B.V.},
	abstract = {Chromium thin films were prepd. on glass substrate via a two-step thermal deposition and their structural, chem. and tribol. properties were detd.  The x-ray diffraction pattern of the two-step thermally deposited chromium film showed the presence of well-defined body-centered cubic Cr metal structure with a prominent (1 1 0) plane.  XPS depth profile showed a presence of \~{}2\% of oxygen in the film within the first five etching cycles showing oxygen incorporation.  Dry sliding wear expts. at temps. ranging from 20 to 200{\textdegree} were conducted.  The thin films were worn with either 100Cr6 or 440C bearing balls using a ball-on-disk sliding configuration at a contact load of 1 N.  Friction coeff. and coating wear rates were measured and wear tracks were analyzed using optical microscopy, SEM and energy-dispersive x-ray spectroscopy.  Thin films exhibited low wear rates at room temp. and an unexpected wear behavior at the elevated temps.  Only the first half of the metallic chromium film was worn out after \~{}18 m of dry sliding at room temp., whereas increase in temp. resulted in a decrease in wear resistance of the film. [on SciFinder(R)]},
	keywords = {chromium film thermal deposition photomask friction wear},
	isbn = {0169-4332},
	author = {Lazauskas, A. and Baltrusaitis, J. and Grigaliunas, V. and Baltusnikas, A. and Abakeviciene, B. and Polcar, T.}
}
@article {179,
	title = {A thin chromium film formation monitoring method: Monitoring of the early stages.},
	journal = {Thin Solid Films},
	volume = {516},
	year = {2008},
	note = {CAPLUS AN 2008:275961(Journal)},
	month = {2008///},
	pages = {2943 - 2947},
	publisher = {Elsevier B.V.},
	abstract = {A method to monitor thin film deposition on insulating and semiconductive substrates based on the surface cond. measurements is proposed.  This method differs from previous thin film cond. measurement methods by the absence of an external power source.  Instead, it employs natural charges carried by ions and electrons that are present in a vapor that is deposited.  The ability to monitor thin film cond., starting with early nucleation stages up to the formation of the integrally conductive film is shown by a comparison of in-situ recorded voltage changes and ex-situ by XPS and at. force microscopy anal. of the stepwise covered samples.  Repeatability of the exptl. data was within a {\textpm} 25\% interval at the exptl. parameter region where an integrally conductive film starts to form. [on SciFinder(R)]},
	keywords = {chromium thin film formation monitoring surface cond},
	isbn = {0040-6090},
	author = {Jukna, T. and Baltrusaitis, J. and Sinkevicius, V. and Virzonis, D.}
}
