@article {59,
	title = {Characterization of linear alkyl phosphonate self-assembled on perovskite substrate.},
	journal = {Applied Surface Science},
	volume = {344},
	year = {2015},
	note = {CAPLUS AN 2015:565720(Journal; Online Computer File)},
	month = {2015},
	pages = {159 - 162},
	publisher = {Elsevier B.V.},
	abstract = {In recent years, functional material surface functionalization has grown into an expanding area of research due to the development and design of advanced systems and devices for key areas in biotechnol., smart sensing, environmental applications and manufg.  NdNiO3 surface was functionalized with octadecylphosphonic acid (ODP) using liq. phase reaction to attain superhydrophobic properties.  The resulting ODP modified surface exhibited dual-scale roughness with a stable static contact angle of 170 {\textpm} 2{\textdegree}.  Electron microscopy micrographs of ODP crystals formed revealed a nonuniform lateral growth characteristics.  The presence of ODP hydrocarbon chains was confirmed using FTIR spectroscopy with characteristic peaks at 2924 cm-1 and 2851 cm-1. [on SciFinder(R)]},
	keywords = {linear alkyl phosphonate self assembled perovskite substrate},
	isbn = {0169-4332},
	author = {Lazauskas, A. and Baltrusaitis, J. and Grigaliunas, V. and Prosycevas, I.}
}
@article {96,
	title = {Thermally-driven structural changes of graphene oxide multilayer films deposited on glass substrate.},
	journal = {Superlattices and Microstructures},
	volume = {75},
	year = {2014},
	note = {CAPLUS AN 2014:1440905(Journal; Online Computer File)},
	pages = {461 - 467},
	publisher = {Elsevier Ltd.},
	abstract = {Graphene oxide (GO) has been recognized as an important intermediate compd. for a potential low-cost large-scale graphene-like film fabrication.  In this work, graphene oxide multilayer films deposited on glass substrate were reduced using different thermal redn. methods, including low-temp. annealing, flame-induced and laser redn., and the corresponding surface morphol. and structural properties were investigated.  These graphene oxide thermal redn. methods strongly affected surface morphol. and differently facilitated structural and chem. transformations of graphene oxide.  As evidenced by Raman measurements, thermal annealing and laser redn. of graphene oxide produced more ordered graphene-like structure multilayer films.  However, surface morphol. differences were obsd. and attributed to the different de-oxidn. mechanisms of GO.  This Letter provides an important systematic comparison between the GO redn. methods and thermally-driven structural changes they provide to the reduced GO multilayer films obtained. [on SciFinder(R)]},
	keywords = {glass substrate graphene oxide multilayer film deposition structural change},
	isbn = {0749-6036},
	author = {Lazauskas, A. and Baltrusaitis, J. and Grigaliunas, V. and Guobiene, A. and Prosycevas, I. and Narmontas, P. and Abakeviciene, B. and Tamulevicius, S.}
}
@article {112,
	title = {Polyvinylpyrrolidone surface modification with SiOx containing amorphous hydrogenated carbon (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx films using Hall-type closed drift ion beam source.},
	journal = {Thin Solid Films},
	volume = {538},
	year = {2013},
	note = {CAPLUS AN 2012:1904654(Journal; Online Computer File)},
	pages = {25 - 31},
	publisher = {Elsevier B.V.},
	abstract = {In this study SiOx contg. amorphous hydrogenated C (a-C:H/SiOx) and N-doped a-C:H/SiOx (a-C:H:N/SiOx) films were deposited on polyvinylpyrrolidone (PVP) templates of variable thickness using a Hall-type closed drift ion beam source with const. irradn. parameters.  A detailed surface characterization was followed using at. force microscopy (AFM) topog. images, surface morphol. parameters, height distribution histograms and bearing ratio curves with hybrid parameters.  The AFM anal. directly showed that the a-C:H/SiOx/PVP and a-C:H:N/SiOx/PVP composite films represent different morphologies with characteristic surface textures.  Surface adhesive properties were evaluated by measuring the force required to sep. the AFM tip from the surface by AFM force-distance curves.  The variance in adhesion force detected was lower for a-C:H/SiOx/PVP composite films due to lower structural homogeneity of the surfaces.  FTIR spectroscopy anal. was performed to study the blend behavior of PVP upon a-C:H/SiOx and a-C:H:N/SiOx direct ion beam deposition.  Interfacial interactions of PVP with the direct ion beam induced changes in the carbonyl group of the PVP and are dependent on the carrier gas used for the synthesis of the amorphous hydrogenated C films. [on SciFinder(R)]},
	keywords = {ion beam, polyvinylpyrrolidone PVP surface modification amorphous carbon silicon oxide},
	isbn = {0040-6090},
	author = {Lazauskas, A. and Grigaliunas, V. and Guobiene, A. and Puiso, J. and Prosycevas, I. and Baltrusaitis, J.}
}
@article {117,
	title = {Surface morphology, cohesive and adhesive properties of amorphous hydrogenated carbon nanocomposite films.},
	journal = {Applied Surface Science},
	volume = {276},
	year = {2013},
	note = {CAPLUS AN 2013:610809(Journal; Online Computer File)},
	pages = {543 - 549},
	publisher = {Elsevier B.V.},
	abstract = {In this work, amorphous hydrogenated carbon (a-C:H), SiOx-contg. a-C:H (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx (a-C:H:N/SiOx) thin films were deposited on chromium thin film-coated glass using a closed drift ion beam source.  Acetylene gas, hexamethyldisiloxane and hydrogen or 20\% nitrogen/hydrogen mixt. were used as precursors.  Resulting hydrogenated carbon thin film surface morphol. as well as their cohesive and adhesive properties were studied using progressive loading scratch tests followed by optical microscopy anal.  Surface anal. was also performed using at. force microscopy via topog., surface morphol. parameter, height distribution histogram and bearing ratio curve based hybrid parameter measurements.  The a-C:H/SiOx and a-C:H:N/SiOx thin films showed better mech. strength as compared to the conventional a-C:H films.  XPS was used to det. the chem. compn. of these films.  It showed increased amts. of silicon and absence of terminal oxygenated carbon bonds in a-C:H:N/SiOx thin film which was attributed to its improved mech. properties. [on SciFinder(R)]},
	keywords = {amorphous hydrogenated carbon film morphol property nitrogen silicon doping},
	isbn = {0169-4332},
	author = {Lazauskas, A. and Grigaliunas, V. and Meskinis, S. and Ecarla, F. and Baltrusaitis, J.}
}
@article {123,
	title = {Tribological properties of the two-step thermally deposited chromium films.},
	journal = {Applied Surface Science},
	volume = {283},
	year = {2013},
	note = {CAPLUS AN 2013:1219922(Journal; Online Computer File)},
	pages = {1089 - 1095},
	publisher = {Elsevier B.V.},
	abstract = {Chromium thin films were prepd. on glass substrate via a two-step thermal deposition and their structural, chem. and tribol. properties were detd.  The x-ray diffraction pattern of the two-step thermally deposited chromium film showed the presence of well-defined body-centered cubic Cr metal structure with a prominent (1 1 0) plane.  XPS depth profile showed a presence of \~{}2\% of oxygen in the film within the first five etching cycles showing oxygen incorporation.  Dry sliding wear expts. at temps. ranging from 20 to 200{\textdegree} were conducted.  The thin films were worn with either 100Cr6 or 440C bearing balls using a ball-on-disk sliding configuration at a contact load of 1 N.  Friction coeff. and coating wear rates were measured and wear tracks were analyzed using optical microscopy, SEM and energy-dispersive x-ray spectroscopy.  Thin films exhibited low wear rates at room temp. and an unexpected wear behavior at the elevated temps.  Only the first half of the metallic chromium film was worn out after \~{}18 m of dry sliding at room temp., whereas increase in temp. resulted in a decrease in wear resistance of the film. [on SciFinder(R)]},
	keywords = {chromium film thermal deposition photomask friction wear},
	isbn = {0169-4332},
	author = {Lazauskas, A. and Baltrusaitis, J. and Grigaliunas, V. and Baltusnikas, A. and Abakeviciene, B. and Polcar, T.}
}
@article {125,
	title = {Water droplet behavior on superhydrophobic SiO2 nanocomposite films during icing/deicing cycles.},
	journal = {Materials Characterization},
	volume = {82},
	year = {2013},
	note = {CAPLUS AN 2013:1032641(Journal; Online Computer File)},
	pages = {9 - 16},
	publisher = {Elsevier},
	abstract = {This work investigates water droplet behavior on superhydrophobic (water contact angle value of 162 {\textpm} 1{\textdegree}) SiO2 nanocomposite films subjected to repetitive icing/deicing treatments, changes in SiO2 nanocomposite film surface morphol. and their non-wetting characteristics.  During the expt., water droplets on SiO2 nanocomposite film surface are subjected to a series of icing and deicing cycles in a humid (\~{} 70\% relative humidity) atm. and the resulting morphol. changes are monitored and characterized using at. force microscopy (AFM) and contact angle measurements.  The formation of the frozen or thawed water droplet, with no further shape change, on superhydrophobic SiO2 nanocomposite film, is obtained faster within each cycle as the no. of the icing/deicing cycles increases.  After 10 icing and deicing cycles, the superhydrophobic SiO2 nanocomposite film had a water contact angle value of 146 {\textpm} 2{\textdegree} which is effectively non-superhydrophobic.  AFM anal. showed that the superhydrophobic SiO2 nanocomposite film surface area under the water droplet undergoes gradual mech. damage during the repetitive icing/deicing cycles.  We propose a possible mechanism of the morphol. changes to the film surface that take place during the consecutive icing/deicing expts. [on SciFinder(R)]},
	keywords = {silica film interface hydrophobicity water droplet icing deicing},
	isbn = {1044-5803},
	author = {Lazauskas, A. and Guobiene, A. and Prosycevas, I. and Baltrusaitis, V. and Grigaliunas, V. and Narmontas, P. and Baltrusaitis, J.}
}
@article {127,
	title = {Atomic force microscopy and X-ray photoelectron spectroscopy evaluation of adhesion and nanostructure of thin Cr films.},
	journal = {Thin Solid Films},
	volume = {520},
	year = {2012},
	note = {CAPLUS AN 2012:853984(Journal; Online Computer File)},
	pages = {6328 - 6333},
	publisher = {Elsevier B.V.},
	abstract = {Cr thin films were deposited on float glass using electron beam (e-beam) phys. vapor deposition and radio frequency (RF) magnetron sputtering techniques.  Surface morphol. of these Cr films was studied using AFM.  The e-beam deposited Cr films consisted of isolated surface mounds while in RF sputtered samples, these mounds combined to form larger islands.  However surface adhesive properties were obsd. for e-beam deposited films, as detd. from AFM force-distance curves, presumably due to the nanostructural differences.  Similar amts. of adsorbed atm. carbonaceous contaminants and water vapor were detected on samples deposited using both methods with e-beam deposited samples having addnl. carbide species, as detd. by XPS data.  The dominant crystallog. plane in both e-beam deposited and RF sputtered Cr thin films was (110) of body-centered cubic Cr metal structure as detd. from x-ray diffraction data.  Weak (211) reflection was also obsd. in RF sputtered samples and was attributed to a different thin Cr film condensation and growth mechanism which resulted in nanostructural differences between films deposited using two different methods. [on SciFinder(R)]},
	keywords = {chromium nanofilm deposition surface compn roughness},
	isbn = {0040-6090},
	author = {Lazauskas, A. and Grigaliunas, V. and Guobiene, A. and Andrulevicius, M. and Baltrusaitis, J.}
}
@article {175,
	title = {Plasma etching of virtually stress-free stacked silicon nitride films.},
	journal = {Thin Solid Films},
	volume = {517},
	year = {2009},
	note = {CAPLUS AN 2009:661551(Journal)},
	month = {2009///},
	pages = {5769 - 5772},
	publisher = {Elsevier B.V.},
	abstract = {Stacked silicon nitride films for use in manufg. of surface micromachined membranes were deposited using custom made plasma-enhanced chem. vapor deposition instrument with silane (SiH4) and ammonia (NH3) gas mixt. as deposition precursor.  Deposition conditions were adjusted by varying substrate temp. and SiH4:NH3 flow ratio and temp. to obtain the required stress related and elec. properties of the membranes.  Transmission FTIR spectroscopy and SEM were used to investigate the chem. compn. and morphol. of the stacked film components.  An increase in the SiH4:NH3 flow ratio and a decrease in temp. resulted in a silicon-rich silicon nitride film, as well as an increased silicon oxide concn.  To avoid under-etch and sidewall defects, the plasma power d. during the plasma etching was changed from 0.5 W/cm2 during the etching of both top and bottom layers in a stacked film, to 1.0 W/cm2 during the etching of the middle both silicon and silicon oxide-rich film.  This resulted in an improved overall stacked film sidewall quality and reduced the unwanted under-etch. [on SciFinder(R)]},
	keywords = {stacked silicon nitride film CVD plasma etching property MEMS},
	isbn = {0040-6090},
	author = {Mikolajunas, M. and Baltrusaitis, J. and Kopustinskas, V. and Vanagas, G. and Grigaliunas, V. and Virzonis, D.}
}
@article {178,
	title = {A study of stacked PECVD silicon nitride films used for surface micromachined membranes.},
	journal = {Thin Solid Films},
	volume = {516},
	year = {2008},
	note = {CAPLUS AN 2008:1086703(Journal)},
	month = {2008///},
	pages = {8788 - 8792},
	publisher = {Elsevier B.V.},
	abstract = {Silicon nitride stacked films contg. three layers differing in mech.-chem. properties are synthesized using plasma-enhanced chem. vapor deposition method from monosilane (SiH4) and ammonia (NH3) mixt.  The compn. is analyzed using XPS and stress is measured using a substrate bending method.  The ability to obtain stacked films with the custom tensile stress in the overall structure was demonstrated by the series of expts.  The tensile stress in the top and bottom films was obtained between 200 and 300 MPa whereas the stress in the middle film could be adjusted from compressive 60 MPa to tensile 300 MPa.  Since the appropriate stress value is important in achieving required mech. properties of the membranes, the results obtained are discussed in the context of surface micromachined membrane structures. [on SciFinder(R)]},
	keywords = {plasma CVD stacked silicon nitride film surface micromachined membrane},
	isbn = {0040-6090},
	author = {Mikolajunas, M. and Kaliasas, R. and Andrulevicius, M. and Grigaliunas, V. and Baltrusaitis, J. and Virzonis, D.}
}
