@article {43,
	title = {Bactericidal effect of graphene oxide/Cu/Ag nanoderivatives against Escherichia coli, Pseudomonas aeruginosa, Klebsiella pneumoniae, Staphylococcus aureus and Methicillin-resistant Staphylococcus aureus.},
	journal = {International Journal of Pharmaceutics (Amsterdam, Netherlands)},
	volume = {511},
	year = {2016},
	note = {CAPLUS AN 2016:1171677(Journal; Online Computer File)},
	month = {2016},
	pages = {90 - 97},
	publisher = {Elsevier B.V.},
	abstract = {A systematic anal. of antibacterial activity of individual nanoderivatives, e.g. GO nanosheets, Ag and Cu nanoparticles (NPs), as well as combinations of Cu-Ag NPs, and GO-Cu-Ag nanocomposites against Escherichia coli, Pseudomonas aeruginosa, Staphylococcus aureus, Klebsiella pneumoniae and Methicillin-resistant Staphylococcus aureus (MRSA) was performed.  Chem. properties of the GO, Cu and Ag NPs were detd. employing XPS and X-Ray-excited Auger electron spectroscopy.  Morphol. of corresponding nanoderivatives was studied employing transmission electron microscopy and SEM.  It was shown that combination of Cu and Ag NPs, as well as GO-Cu-Ag nanocomposite material possess enhanced antibacterial activity through a possible synergy between multiple toxicity mechanisms.  MRSA showed highest resistance in all cases. [on SciFinder(R)]},
	keywords = {antibacterial graphene oxide copper silver nanocomposite},
	isbn = {0378-5173},
	author = {Jankauskaite, V. and Vitkauskiene, A. and Lazauskas, A. and Baltrusaitis, J. and Prosycevas, I. and Andrulevicius, M.}
}
@article {46,
	title = {Characterization of urea derived polymeric carbon nitride and resultant thermally vacuum deposited amorphous thin films: Structural, chemical and photophysical properties.},
	journal = {Carbon},
	volume = {107},
	year = {2016},
	note = {CAPLUS AN 2016:1055602(Journal; Online Computer File)},
	month = {2016},
	pages = {415 - 425},
	publisher = {Elsevier Ltd.},
	abstract = {Polymeric carbon nitride (p-CN) was produced using a two-step thermal treatment process of urea without tailoring the reaction pressure and atm.  A systematic anal. employing XPS, Fourier transform IR spectroscopy, Raman scattering and x-ray diffraction (x-ray diffraction) was performed for structural and chem. characterization of p-CN.  Thermal vacuum deposition of thin films (C3N) from p-CN powder was performed, followed by characterization of corresponding structural, chem. and photophys. properties.  The at. force microscopy anal. of these films revealed sheet-like structural fragments distributed along the surface.  The C3N thin films were amorphous as detd. from x-ray diffraction.  C3N can be used as a functional layer for optoelectronic devices. [on SciFinder(R)]},
	keywords = {urea polymeric carbon nitride amorphous film photocatalyst optoelectronic device},
	isbn = {0008-6223},
	author = {Lazauskas, A. and Baltrusaitis, J. and Puodziukynas, L. and Andrulevicius, M. and Bagdziunas, G. and Volyniuk, D. and Meskinis, S. and Niaura, G. and Tamulevicius, T. and Jankauskaite, V.}
}
@article {127,
	title = {Atomic force microscopy and X-ray photoelectron spectroscopy evaluation of adhesion and nanostructure of thin Cr films.},
	journal = {Thin Solid Films},
	volume = {520},
	year = {2012},
	note = {CAPLUS AN 2012:853984(Journal; Online Computer File)},
	pages = {6328 - 6333},
	publisher = {Elsevier B.V.},
	abstract = {Cr thin films were deposited on float glass using electron beam (e-beam) phys. vapor deposition and radio frequency (RF) magnetron sputtering techniques.  Surface morphol. of these Cr films was studied using AFM.  The e-beam deposited Cr films consisted of isolated surface mounds while in RF sputtered samples, these mounds combined to form larger islands.  However surface adhesive properties were obsd. for e-beam deposited films, as detd. from AFM force-distance curves, presumably due to the nanostructural differences.  Similar amts. of adsorbed atm. carbonaceous contaminants and water vapor were detected on samples deposited using both methods with e-beam deposited samples having addnl. carbide species, as detd. by XPS data.  The dominant crystallog. plane in both e-beam deposited and RF sputtered Cr thin films was (110) of body-centered cubic Cr metal structure as detd. from x-ray diffraction data.  Weak (211) reflection was also obsd. in RF sputtered samples and was attributed to a different thin Cr film condensation and growth mechanism which resulted in nanostructural differences between films deposited using two different methods. [on SciFinder(R)]},
	keywords = {chromium nanofilm deposition surface compn roughness},
	isbn = {0040-6090},
	author = {Lazauskas, A. and Grigaliunas, V. and Guobiene, A. and Andrulevicius, M. and Baltrusaitis, J.}
}
@article {178,
	title = {A study of stacked PECVD silicon nitride films used for surface micromachined membranes.},
	journal = {Thin Solid Films},
	volume = {516},
	year = {2008},
	note = {CAPLUS AN 2008:1086703(Journal)},
	month = {2008///},
	pages = {8788 - 8792},
	publisher = {Elsevier B.V.},
	abstract = {Silicon nitride stacked films contg. three layers differing in mech.-chem. properties are synthesized using plasma-enhanced chem. vapor deposition method from monosilane (SiH4) and ammonia (NH3) mixt.  The compn. is analyzed using XPS and stress is measured using a substrate bending method.  The ability to obtain stacked films with the custom tensile stress in the overall structure was demonstrated by the series of expts.  The tensile stress in the top and bottom films was obtained between 200 and 300 MPa whereas the stress in the middle film could be adjusted from compressive 60 MPa to tensile 300 MPa.  Since the appropriate stress value is important in achieving required mech. properties of the membranes, the results obtained are discussed in the context of surface micromachined membrane structures. [on SciFinder(R)]},
	keywords = {plasma CVD stacked silicon nitride film surface micromachined membrane},
	isbn = {0040-6090},
	author = {Mikolajunas, M. and Kaliasas, R. and Andrulevicius, M. and Grigaliunas, V. and Baltrusaitis, J. and Virzonis, D.}
}
