<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Lazauskas, A.</style></author><author><style face="normal" font="default" size="100%">Baltrusaitis, J.</style></author><author><style face="normal" font="default" size="100%">Grigaliunas, V.</style></author><author><style face="normal" font="default" size="100%">Guobiene, A.</style></author><author><style face="normal" font="default" size="100%">Prosycevas, I.</style></author><author><style face="normal" font="default" size="100%">Narmontas, P.</style></author><author><style face="normal" font="default" size="100%">Abakeviciene, B.</style></author><author><style face="normal" font="default" size="100%">Tamulevicius, S.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Thermally-driven structural changes of graphene oxide multilayer films deposited on glass substrate.</style></title><secondary-title><style face="normal" font="default" size="100%">Superlattices and Microstructures</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">glass substrate graphene oxide multilayer film deposition structural change</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2014</style></year></dates><publisher><style face="normal" font="default" size="100%">Elsevier Ltd.</style></publisher><volume><style face="normal" font="default" size="100%">75</style></volume><pages><style face="normal" font="default" size="100%">461 - 467</style></pages><isbn><style face="normal" font="default" size="100%">0749-6036</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">Graphene oxide (GO) has been recognized as an important intermediate compd. for a potential low-cost large-scale graphene-like film fabrication.  In this work, graphene oxide multilayer films deposited on glass substrate were reduced using different thermal redn. methods, including low-temp. annealing, flame-induced and laser redn., and the corresponding surface morphol. and structural properties were investigated.  These graphene oxide thermal redn. methods strongly affected surface morphol. and differently facilitated structural and chem. transformations of graphene oxide.  As evidenced by Raman measurements, thermal annealing and laser redn. of graphene oxide produced more ordered graphene-like structure multilayer films.  However, surface morphol. differences were obsd. and attributed to the different de-oxidn. mechanisms of GO.  This Letter provides an important systematic comparison between the GO redn. methods and thermally-driven structural changes they provide to the reduced GO multilayer films obtained. [on SciFinder(R)]</style></abstract><notes><style face="normal" font="default" size="100%">CAPLUS AN 2014:1440905(Journal; Online Computer File)</style></notes></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Lazauskas, A.</style></author><author><style face="normal" font="default" size="100%">Grigaliunas, V.</style></author><author><style face="normal" font="default" size="100%">Guobiene, A.</style></author><author><style face="normal" font="default" size="100%">Puiso, J.</style></author><author><style face="normal" font="default" size="100%">Prosycevas, I.</style></author><author><style face="normal" font="default" size="100%">Baltrusaitis, J.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Polyvinylpyrrolidone surface modification with SiOx containing amorphous hydrogenated carbon (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx films using Hall-type closed drift ion beam source.</style></title><secondary-title><style face="normal" font="default" size="100%">Thin Solid Films</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">ion beam</style></keyword><keyword><style  face="normal" font="default" size="100%">polyvinylpyrrolidone PVP surface modification amorphous carbon silicon oxide</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2013</style></year></dates><publisher><style face="normal" font="default" size="100%">Elsevier B.V.</style></publisher><volume><style face="normal" font="default" size="100%">538</style></volume><pages><style face="normal" font="default" size="100%">25 - 31</style></pages><isbn><style face="normal" font="default" size="100%">0040-6090</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">In this study SiOx contg. amorphous hydrogenated C (a-C:H/SiOx) and N-doped a-C:H/SiOx (a-C:H:N/SiOx) films were deposited on polyvinylpyrrolidone (PVP) templates of variable thickness using a Hall-type closed drift ion beam source with const. irradn. parameters.  A detailed surface characterization was followed using at. force microscopy (AFM) topog. images, surface morphol. parameters, height distribution histograms and bearing ratio curves with hybrid parameters.  The AFM anal. directly showed that the a-C:H/SiOx/PVP and a-C:H:N/SiOx/PVP composite films represent different morphologies with characteristic surface textures.  Surface adhesive properties were evaluated by measuring the force required to sep. the AFM tip from the surface by AFM force-distance curves.  The variance in adhesion force detected was lower for a-C:H/SiOx/PVP composite films due to lower structural homogeneity of the surfaces.  FTIR spectroscopy anal. was performed to study the blend behavior of PVP upon a-C:H/SiOx and a-C:H:N/SiOx direct ion beam deposition.  Interfacial interactions of PVP with the direct ion beam induced changes in the carbonyl group of the PVP and are dependent on the carrier gas used for the synthesis of the amorphous hydrogenated C films. [on SciFinder(R)]</style></abstract><notes><style face="normal" font="default" size="100%">CAPLUS AN 2012:1904654(Journal; Online Computer File)</style></notes></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Lazauskas, A.</style></author><author><style face="normal" font="default" size="100%">Guobiene, A.</style></author><author><style face="normal" font="default" size="100%">Prosycevas, I.</style></author><author><style face="normal" font="default" size="100%">Baltrusaitis, V.</style></author><author><style face="normal" font="default" size="100%">Grigaliunas, V.</style></author><author><style face="normal" font="default" size="100%">Narmontas, P.</style></author><author><style face="normal" font="default" size="100%">Baltrusaitis, J.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Water droplet behavior on superhydrophobic SiO2 nanocomposite films during icing/deicing cycles.</style></title><secondary-title><style face="normal" font="default" size="100%">Materials Characterization</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">silica film interface hydrophobicity water droplet icing deicing</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2013</style></year></dates><publisher><style face="normal" font="default" size="100%">Elsevier</style></publisher><volume><style face="normal" font="default" size="100%">82</style></volume><pages><style face="normal" font="default" size="100%">9 - 16</style></pages><isbn><style face="normal" font="default" size="100%">1044-5803</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">This work investigates water droplet behavior on superhydrophobic (water contact angle value of 162 ± 1°) SiO2 nanocomposite films subjected to repetitive icing/deicing treatments, changes in SiO2 nanocomposite film surface morphol. and their non-wetting characteristics.  During the expt., water droplets on SiO2 nanocomposite film surface are subjected to a series of icing and deicing cycles in a humid (∼ 70% relative humidity) atm. and the resulting morphol. changes are monitored and characterized using at. force microscopy (AFM) and contact angle measurements.  The formation of the frozen or thawed water droplet, with no further shape change, on superhydrophobic SiO2 nanocomposite film, is obtained faster within each cycle as the no. of the icing/deicing cycles increases.  After 10 icing and deicing cycles, the superhydrophobic SiO2 nanocomposite film had a water contact angle value of 146 ± 2° which is effectively non-superhydrophobic.  AFM anal. showed that the superhydrophobic SiO2 nanocomposite film surface area under the water droplet undergoes gradual mech. damage during the repetitive icing/deicing cycles.  We propose a possible mechanism of the morphol. changes to the film surface that take place during the consecutive icing/deicing expts. [on SciFinder(R)]</style></abstract><notes><style face="normal" font="default" size="100%">CAPLUS AN 2013:1032641(Journal; Online Computer File)</style></notes></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Lazauskas, A.</style></author><author><style face="normal" font="default" size="100%">Grigaliunas, V.</style></author><author><style face="normal" font="default" size="100%">Guobiene, A.</style></author><author><style face="normal" font="default" size="100%">Andrulevicius, M.</style></author><author><style face="normal" font="default" size="100%">Baltrusaitis, J.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Atomic force microscopy and X-ray photoelectron spectroscopy evaluation of adhesion and nanostructure of thin Cr films.</style></title><secondary-title><style face="normal" font="default" size="100%">Thin Solid Films</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">chromium nanofilm deposition surface compn roughness</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2012</style></year></dates><publisher><style face="normal" font="default" size="100%">Elsevier B.V.</style></publisher><volume><style face="normal" font="default" size="100%">520</style></volume><pages><style face="normal" font="default" size="100%">6328 - 6333</style></pages><isbn><style face="normal" font="default" size="100%">0040-6090</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">Cr thin films were deposited on float glass using electron beam (e-beam) phys. vapor deposition and radio frequency (RF) magnetron sputtering techniques.  Surface morphol. of these Cr films was studied using AFM.  The e-beam deposited Cr films consisted of isolated surface mounds while in RF sputtered samples, these mounds combined to form larger islands.  However surface adhesive properties were obsd. for e-beam deposited films, as detd. from AFM force-distance curves, presumably due to the nanostructural differences.  Similar amts. of adsorbed atm. carbonaceous contaminants and water vapor were detected on samples deposited using both methods with e-beam deposited samples having addnl. carbide species, as detd. by XPS data.  The dominant crystallog. plane in both e-beam deposited and RF sputtered Cr thin films was (110) of body-centered cubic Cr metal structure as detd. from x-ray diffraction data.  Weak (211) reflection was also obsd. in RF sputtered samples and was attributed to a different thin Cr film condensation and growth mechanism which resulted in nanostructural differences between films deposited using two different methods. [on SciFinder(R)]</style></abstract><issue><style face="normal" font="default" size="100%">19</style></issue><notes><style face="normal" font="default" size="100%">CAPLUS AN 2012:853984(Journal; Online Computer File)</style></notes></record><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Sinkeviciute, D.</style></author><author><style face="normal" font="default" size="100%">Dukstiene, N.</style></author><author><style face="normal" font="default" size="100%">Baltrusaitis, J.</style></author><author><style face="normal" font="default" size="100%">Guobiene, A.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Principles of electrochemical reduction of Na2MoO4 on a Se/SnO2/glass surface.</style></title><secondary-title><style face="normal" font="default" size="100%">Chemine Technologija (Kaunas, Lithuania)</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">sodium molybdate electrochem redn tin dioxide selenium glass surface</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2010</style></year><pub-dates><date><style  face="normal" font="default" size="100%">2010///</style></date></pub-dates></dates><publisher><style face="normal" font="default" size="100%">Technologija</style></publisher><pages><style face="normal" font="default" size="100%">28 - 35</style></pages><isbn><style face="normal" font="default" size="100%">1392-1231</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">Na2MoO4 electrochem. redn. from 0.22 mol/dm3 sodium citrate supporting soln. was investigated by the cyclic voltammetry, XPS and lateral force microscopy techniques.  Exptl. results have indicated that molybdenum oxide is initially deposited on the Se/SnO2/glass surface in a potential range from -0.20 V to -0.80 V.  XPS anal. exhibited the molybdenum oxide stoichiometry of 2.9.  The nucleation mechanism of MoOx onto Se/SnO2/glass surface was investigated by the current transient technique.  The deposition transients analyzed in the non-dimensional plots I2/I2m = f(t/tm) and I2/I2m = f(t/tm)2 have shown that MoOx nucleates according to a progressive mechanism.  The nucleation rate depends on Na2MoO4 concn. in the supporting electrolyte and on the deposition potential. [on SciFinder(R)]</style></abstract><issue><style face="normal" font="default" size="100%">1</style></issue><notes><style face="normal" font="default" size="100%">CAPLUS AN 2010:548442(Journal)</style></notes></record></records></xml>