<style face="normal" font="default" size="100%">Scaling down lateral dimensions of silicon nanopillars fabricated by reactive ion etching with Au/Cr self-assembled clusters as an etch mask.</style>

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<style face="normal" font="default" size="100%">Scaling down lateral dimensions of silicon nanopillars fabricated by reactive ion etching with Au/Cr self-assembled clusters as an etch mask.</style>

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<style face="normal" font="default" size="100%">Plasma etching of virtually stress-free stacked silicon nitride films.</style>

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<style face="normal" font="default" size="100%">A study of stacked PECVD silicon nitride films used for surface micromachined membranes.</style>

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<style face="normal" font="default" size="100%">A thin chromium film formation monitoring method: Monitoring of the early stages.</style>