<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Lazauskas, A.</style></author><author><style face="normal" font="default" size="100%">Baltrusaitis, J.</style></author><author><style face="normal" font="default" size="100%">Puodziukynas, L.</style></author><author><style face="normal" font="default" size="100%">Andrulevicius, M.</style></author><author><style face="normal" font="default" size="100%">Bagdziunas, G.</style></author><author><style face="normal" font="default" size="100%">Volyniuk, D.</style></author><author><style face="normal" font="default" size="100%">Meskinis, S.</style></author><author><style face="normal" font="default" size="100%">Niaura, G.</style></author><author><style face="normal" font="default" size="100%">Tamulevicius, T.</style></author><author><style face="normal" font="default" size="100%">Jankauskaite, V.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Characterization of urea derived polymeric carbon nitride and resultant thermally vacuum deposited amorphous thin films: Structural, chemical and photophysical properties.</style></title><secondary-title><style face="normal" font="default" size="100%">Carbon</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">urea polymeric carbon nitride amorphous film photocatalyst optoelectronic device</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2016</style></year><pub-dates><date><style  face="normal" font="default" size="100%">2016</style></date></pub-dates></dates><publisher><style face="normal" font="default" size="100%">Elsevier Ltd.</style></publisher><volume><style face="normal" font="default" size="100%">107</style></volume><pages><style face="normal" font="default" size="100%">415 - 425</style></pages><isbn><style face="normal" font="default" size="100%">0008-6223</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">Polymeric carbon nitride (p-CN) was produced using a two-step thermal treatment process of urea without tailoring the reaction pressure and atm.  A systematic anal. employing XPS, Fourier transform IR spectroscopy, Raman scattering and x-ray diffraction (x-ray diffraction) was performed for structural and chem. characterization of p-CN.  Thermal vacuum deposition of thin films (C3N) from p-CN powder was performed, followed by characterization of corresponding structural, chem. and photophys. properties.  The at. force microscopy anal. of these films revealed sheet-like structural fragments distributed along the surface.  The C3N thin films were amorphous as detd. from x-ray diffraction.  C3N can be used as a functional layer for optoelectronic devices. [on SciFinder(R)]</style></abstract><notes><style face="normal" font="default" size="100%">CAPLUS AN 2016:1055602(Journal; Online Computer File)</style></notes></record></records></xml>