<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Lazauskas, A.</style></author><author><style face="normal" font="default" size="100%">Grigaliunas, V.</style></author><author><style face="normal" font="default" size="100%">Guobiene, A.</style></author><author><style face="normal" font="default" size="100%">Andrulevicius, M.</style></author><author><style face="normal" font="default" size="100%">Baltrusaitis, J.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Atomic force microscopy and X-ray photoelectron spectroscopy evaluation of adhesion and nanostructure of thin Cr films.</style></title><secondary-title><style face="normal" font="default" size="100%">Thin Solid Films</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">chromium nanofilm deposition surface compn roughness</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2012</style></year></dates><publisher><style face="normal" font="default" size="100%">Elsevier B.V.</style></publisher><volume><style face="normal" font="default" size="100%">520</style></volume><pages><style face="normal" font="default" size="100%">6328 - 6333</style></pages><isbn><style face="normal" font="default" size="100%">0040-6090</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">Cr thin films were deposited on float glass using electron beam (e-beam) phys. vapor deposition and radio frequency (RF) magnetron sputtering techniques.  Surface morphol. of these Cr films was studied using AFM.  The e-beam deposited Cr films consisted of isolated surface mounds while in RF sputtered samples, these mounds combined to form larger islands.  However surface adhesive properties were obsd. for e-beam deposited films, as detd. from AFM force-distance curves, presumably due to the nanostructural differences.  Similar amts. of adsorbed atm. carbonaceous contaminants and water vapor were detected on samples deposited using both methods with e-beam deposited samples having addnl. carbide species, as detd. by XPS data.  The dominant crystallog. plane in both e-beam deposited and RF sputtered Cr thin films was (110) of body-centered cubic Cr metal structure as detd. from x-ray diffraction data.  Weak (211) reflection was also obsd. in RF sputtered samples and was attributed to a different thin Cr film condensation and growth mechanism which resulted in nanostructural differences between films deposited using two different methods. [on SciFinder(R)]</style></abstract><issue><style face="normal" font="default" size="100%">19</style></issue><notes><style face="normal" font="default" size="100%">CAPLUS AN 2012:853984(Journal; Online Computer File)</style></notes></record></records></xml>