<style face="normal" font="default" size="100%">Polyvinylpyrrolidone surface modification with SiOx containing amorphous hydrogenated carbon (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx films using Hall-type closed drift ion beam source.</style>

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<style face="normal" font="default" size="100%">Polyvinylpyrrolidone surface modification with SiOx containing amorphous hydrogenated carbon (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx films using Hall-type closed drift ion beam source.</style>

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17

<style face="normal" font="default" size="100%">Plasma etching of virtually stress-free stacked silicon nitride films.</style>