<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Lazauskas, A.</style></author><author><style face="normal" font="default" size="100%">Grigaliunas, V.</style></author><author><style face="normal" font="default" size="100%">Meskinis, S.</style></author><author><style face="normal" font="default" size="100%">Ecarla, F.</style></author><author><style face="normal" font="default" size="100%">Baltrusaitis, J.</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Surface morphology, cohesive and adhesive properties of amorphous hydrogenated carbon nanocomposite films.</style></title><secondary-title><style face="normal" font="default" size="100%">Applied Surface Science</style></secondary-title></titles><keywords><keyword><style  face="normal" font="default" size="100%">amorphous hydrogenated carbon film morphol property nitrogen silicon doping</style></keyword></keywords><dates><year><style  face="normal" font="default" size="100%">2013</style></year></dates><publisher><style face="normal" font="default" size="100%">Elsevier B.V.</style></publisher><volume><style face="normal" font="default" size="100%">276</style></volume><pages><style face="normal" font="default" size="100%">543 - 549</style></pages><isbn><style face="normal" font="default" size="100%">0169-4332</style></isbn><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">In this work, amorphous hydrogenated carbon (a-C:H), SiOx-contg. a-C:H (a-C:H/SiOx) and nitrogen-doped a-C:H/SiOx (a-C:H:N/SiOx) thin films were deposited on chromium thin film-coated glass using a closed drift ion beam source.  Acetylene gas, hexamethyldisiloxane and hydrogen or 20% nitrogen/hydrogen mixt. were used as precursors.  Resulting hydrogenated carbon thin film surface morphol. as well as their cohesive and adhesive properties were studied using progressive loading scratch tests followed by optical microscopy anal.  Surface anal. was also performed using at. force microscopy via topog., surface morphol. parameter, height distribution histogram and bearing ratio curve based hybrid parameter measurements.  The a-C:H/SiOx and a-C:H:N/SiOx thin films showed better mech. strength as compared to the conventional a-C:H films.  XPS was used to det. the chem. compn. of these films.  It showed increased amts. of silicon and absence of terminal oxygenated carbon bonds in a-C:H:N/SiOx thin film which was attributed to its improved mech. properties. [on SciFinder(R)]</style></abstract><notes><style face="normal" font="default" size="100%">CAPLUS AN 2013:610809(Journal; Online Computer File)</style></notes></record></records></xml>